Fadeev, Alexander Y. published the artcileSelf-Assembly Is Not the Only Reaction Possible between Alkyltrichlorosilanes and Surfaces: Monomolecular and Oligomeric Covalently Attached Layers of Dichloro- and Trichloroalkylsilanes on Silicon, Application of Dichloro(methyl)(octyl)silane, the publication is Langmuir (2000), 16(18), 7268-7274, database is CAplus.
Si-supported alkylsiloxane layers were prepared by reaction of alkylmethyldichlorosilanes and alkyltrichlorosilanes with Si wafers under two conditions: (1) in the vapor phase and (2) in toluene in the presence of ethyldiisopropylamine. Covalent attachment of di- and trichlorosilanes to the surface of Si/Si oxide through SiS-O-Si bonds occurs for the amine-catalyzed reactions. This sets apart this reaction from the self-assembly process that occurs in the reaction between certain trichlorosilanes and hydrated SiO2 with no amine present. The thickness of the layers formed from dichloro- and trichlorosilanes (as assessed by ellipsometry) is on the order of the single mol. sizes and increases gradually with alkyl chain length. The thickness values are considerably smaller (by a factor of ∼0.75) than the length of the fully stretched alkyl chain, which argues for disordered structures of the monolayers. Dynamic advancing and receding contact angles for H2O, methylene iodide, and hexadecane argue for interaction between the probe fluids and accessible silanol groups (Si-OH) on the surface. H2O contact angles increase with alkyl chain length and level at θA/θR ≃103°/∼90° for relatively long alkyl chains (approx. C6 and longer), indicating that these surfaces project disordered Me and methylene groups toward the probe fluid. N-Hexadecane and methylene iodide contact angles show more complex behavior, which is discussed. The vapor-phase reaction of di- and trichlorosilanes with Si wafers yields surfaces that depend dramatically on the alkyl chain of the silane. Alkylsilanes with short and medium chains form polymeric grafted layers with thicknesses ranging from a few nanometers for dichlorosilanes up to tens of nanometers for trichlorosilanes. The authors suggest a mechanism that involves polycondensation of chlorosilanes into 3-dimensional alkylsiloxanes in the presence of adsorbed H2O. Dynamic advancing and receding contact angles of H2O, methylene iodide, and hexadecane on these surfaces are consistently higher than for surfaces prepared in the liquid phase. Alkylsilanes with long alkyl moieties yield approx. monomol. layers that exhibit wettabilities similar to those for surfaces prepared in the liquid phase.
Langmuir published new progress about 14799-93-0. 14799-93-0 belongs to chlorides-buliding-blocks, auxiliary class Aliphatic Chain, name is Dichloro(methyl)(octyl)silane, and the molecular formula is C9H20Cl2Si, Application of Dichloro(methyl)(octyl)silane.
Referemce:
https://en.wikipedia.org/wiki/Chloride,
Chlorides – an overview | ScienceDirect Topics